Water Treatment in the Semiconductor Industry | Reverse Osmosis Systems

Semiconductor water treatment refers to the process of purifying and treating water used in the semiconductor industry. Water is an essential component in semiconductor manufacturing processes, and its quality and purity are critical to ensuring the reliability and performance of semiconductor devices.

The primary purpose of water treatment in the semiconductor industry is to remove impurities and contaminants that can adversely affect the manufacturing process. These impurities can include particulates, organic compounds, dissolved gases, and ionic species such as metals and ions. Even trace amounts of contaminants can lead to defects in semiconductor devices or affect the performance of integrated circuits.

Our water treatment technologies employed for the semiconductor industry include:

Video: An optimal water treatment solution for semiconductor applications

6 Methods and Procedures for Treating Semiconductor Water

Here are some common techniques and processes used in semiconductor water treatment:

  1. Filtration: Filtration is used to remove suspended particles, colloids, and larger impurities from the water. This can be achieved through various filtration methods such as activated carbon filters, multimedia filters, microfiltration, and ultrafiltration.

  2. Reverse Osmosis (RO): Reverse osmosis is a membrane-based process that uses pressure to force water through a semi-permeable membrane, removing dissolved impurities, ions, and most organic compounds. RO is effective in removing a wide range of contaminants and is commonly used as a pre-treatment step in semiconductor water treatment.

  3. Deionization (DI): Deionization, also known as ion exchange, involves passing water through ion exchange resin beds to remove dissolved minerals, ions, and charged impurities. DI is typically used after reverse osmosis to further purify the water and achieve high levels of purity.

  4. Ultra-Pure Water (UPW) System: UPW systems are designed to produce water of extremely high purity required for critical semiconductor manufacturing processes. These systems often combine multiple treatment technologies, including RO, DI, and other advanced purification techniques to achieve the desired water quality.

  5. Advanced Oxidation Processes (AOP): AOPs involve the use of powerful oxidizing agents, such as ozone or ultraviolet (UV) light, to degrade and remove organic compounds and contaminants that are resistant to traditional treatment methods.

  6. Monitoring and Control: Continuous monitoring of water quality parameters, such as resistivity, total organic carbon (TOC), and particle counts, is crucial in semiconductor water treatment. Advanced control systems are employed to maintain consistent water quality and ensure compliance with stringent purity standards.

Semiconductor water treatment is a highly specialized field that requires expertise in water chemistry, process engineering, and the specific requirements of the semiconductor industry. The goal is to produce water of the highest purity to meet the demanding standards necessary for semiconductor fabrication processes and ensure the reliable production of high-quality semiconductor devices.

For more information please view/download the industry brochure