Overview
- Location: United States
- Application: Ultrapure Water for Semiconductor Manufacturing
- Final Product Flow: 85 GPM
- System Type: Multi-Pass Brackish RO + EDI + UV Sterilization
- Storage Capacity: 5,000 gallons
Key Components:
- Pretreatment:
• 48" Multimedia Filter (FRP Tank) – removes turbidity and suspended solids
• 63" Activated Carbon Filter (FRP Tank) – dechlorination and organics removal
• Antiscalant chemical dosing system – prevents scaling and extends RO membrane life - First RO Pass (Model: TW-173K-4680):
• Capacity: 100 GPM, TDS up to 1,000 ppm
• Powder-coated carbon steel frame
• (4) FRP pressure vessels with (24) 8" TFC spiral wound membranes
• Siemens S7-1200 PLC control panel
• Stainless steel 5-micron pre-filter
• Pressure gauges, ORP & conductivity monitoring
• Flow meters and safety pressure switches - Inter-Stage Treatment:
• Post pH adjustment chemical dosing – optimizes pH for second RO stage
• Antiscalant chemical dosing – additional scaling protection - Second RO Pass (Model: TW-130K-3680):
• Capacity: 85 GPM, TDS up to 100 ppm
• (3) FRP pressure vessels with (18) 8" TFC spiral wound membranes
• Siemens S7-1200 PLC control panel
• Stainless steel 5-micron cartridge filter
• Pressure gauges, conductivity monitoring, and flow meters - Product Water Storage:
• 5,000-gallon storage tank with level switches for control
• Serves as a buffer between RO and EDI stages - Electrodeionization (EDI) System:
• Flow rate: 75 GPM (1 duty / 1 standby module)
• Technology: IonPure EDI
• Siemens S7-1200 PLC + Color HMI
• GF Signet TDS/conductivity monitors
• Flow meters, rectifier & transformer assembly
• Powder-coated steel skid with SCH 80 PVC piping
• NEMA 12 control panel - Final Disinfection (Model: SUV-120):
• UV sterilizer rated for 120 GPM
• Provides final safeguard against microbial contamination
[custom-specifications]
The semiconductor facility required a system that could:
- Deliver ultrapure water with extremely low TDS and conductivity.
- Handle feedwater containing chlorine, organics, and suspended solids.
- Protect delicate RO and EDI membranes from scaling, fouling, and chemical damage.
- Operate continuously with redundancy to avoid production downtime.
- Ensure microbial control throughout the process.
[/custom-specifications]
[custom-features]
Pure Aqua engineered a multi-stage ultrapure water treatment system to meet semiconductor industry standards:
- Integrated Pretreatment: Multimedia and carbon filters with antiscalant dosing safeguard RO membranes.
- Dual-Pass RO: Models TW-173K-4680 (first pass) and TW-130K-3680 (second pass) maximize salt rejection and water quality.
- Inter-Stage Optimization: pH adjustment and chemical dosing ensure second-pass RO performance.
- EDI Module: IonPure technology with duty/standby redundancy provides continuous ultrapure water.
- Final Disinfection: UV sterilizer (Model SUV-120) ensures microbial-free water.
- Automation & Monitoring: Siemens PLC + HMI with full instrumentation for conductivity, ORP, flow, and pressure control.
- Storage Integration: 5,000-gallon buffer tank maintains stable supply and system reliability.
[/custom-features]
[custom-usage]
- Consistent Ultrapure Water: Maintains high resistivity, low silica, and minimal organics.
- Dual-Pass RO Efficiency: Maximizes ion rejection, ensuring optimal feedwater to EDI.
- Automated & Smart Control: Siemens PLC and HMI streamline monitoring and operation.
- EDI Redundancy: Duty/standby configuration guarantees uninterrupted water supply.
- High Recovery Rate: 90%+ recovery reduces waste and operating costs.
- Comprehensive Pretreatment & UV Disinfection: Extends system life and minimizes microbial risks.
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