Ultrapure Water System | USA | 85 GPM

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Product Description

Overview

  • Location: United States
  • Application: Ultrapure Water for Semiconductor Manufacturing
  • Final Product Flow: 85 GPM
  • System Type: Multi-Pass Brackish RO + EDI + UV Sterilization
  • Storage Capacity: 5,000 gallons

Key Components:

  • Pretreatment:
    • 48" Multimedia Filter (FRP Tank) – removes turbidity and suspended solids
    • 63" Activated Carbon Filter (FRP Tank) – dechlorination and organics removal
    • Antiscalant chemical dosing system – prevents scaling and extends RO membrane life
  • First RO Pass (Model: TW-173K-4680):
    • Capacity: 100 GPM, TDS up to 1,000 ppm
    • Powder-coated carbon steel frame
    • (4) FRP pressure vessels with (24) 8" TFC spiral wound membranes
    • Siemens S7-1200 PLC control panel
    • Stainless steel 5-micron pre-filter
    • Pressure gauges, ORP & conductivity monitoring
    • Flow meters and safety pressure switches
  • Inter-Stage Treatment:
    • Post pH adjustment chemical dosing – optimizes pH for second RO stage
    • Antiscalant chemical dosing – additional scaling protection
  • Second RO Pass (Model: TW-130K-3680):
    • Capacity: 85 GPM, TDS up to 100 ppm
    • (3) FRP pressure vessels with (18) 8" TFC spiral wound membranes
    • Siemens S7-1200 PLC control panel
    • Stainless steel 5-micron cartridge filter
    • Pressure gauges, conductivity monitoring, and flow meters
  • Product Water Storage:
    • 5,000-gallon storage tank with level switches for control
    • Serves as a buffer between RO and EDI stages
  • Electrodeionization (EDI) System:
    • Flow rate: 75 GPM (1 duty / 1 standby module)
    • Technology: IonPure EDI
    • Siemens S7-1200 PLC + Color HMI
    • GF Signet TDS/conductivity monitors
    • Flow meters, rectifier & transformer assembly
    • Powder-coated steel skid with SCH 80 PVC piping
    • NEMA 12 control panel
  • Final Disinfection (Model: SUV-120):
    • UV sterilizer rated for 120 GPM
    • Provides final safeguard against microbial contamination

[custom-specifications]

The semiconductor facility required a system that could:

  • Deliver ultrapure water with extremely low TDS and conductivity.
  • Handle feedwater containing chlorine, organics, and suspended solids.
  • Protect delicate RO and EDI membranes from scaling, fouling, and chemical damage.
  • Operate continuously with redundancy to avoid production downtime.
  • Ensure microbial control throughout the process.

[/custom-specifications]

[custom-features]

Pure Aqua engineered a multi-stage ultrapure water treatment system to meet semiconductor industry standards:

  • Integrated Pretreatment: Multimedia and carbon filters with antiscalant dosing safeguard RO membranes.
  • Dual-Pass RO: Models TW-173K-4680 (first pass) and TW-130K-3680 (second pass) maximize salt rejection and water quality.
  • Inter-Stage Optimization: pH adjustment and chemical dosing ensure second-pass RO performance.
  • EDI Module: IonPure technology with duty/standby redundancy provides continuous ultrapure water.
  • Final Disinfection: UV sterilizer (Model SUV-120) ensures microbial-free water.
  • Automation & Monitoring: Siemens PLC + HMI with full instrumentation for conductivity, ORP, flow, and pressure control.
  • Storage Integration: 5,000-gallon buffer tank maintains stable supply and system reliability.

[/custom-features]

[custom-usage]

  • Consistent Ultrapure Water: Maintains high resistivity, low silica, and minimal organics.
  • Dual-Pass RO Efficiency: Maximizes ion rejection, ensuring optimal feedwater to EDI.
  • Automated & Smart Control: Siemens PLC and HMI streamline monitoring and operation.
  • EDI Redundancy: Duty/standby configuration guarantees uninterrupted water supply.
  • High Recovery Rate: 90%+ recovery reduces waste and operating costs.
  • Comprehensive Pretreatment & UV Disinfection: Extends system life and minimizes microbial risks.
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